Capacitor Structure

ABSTRACT

One or more embodiments are related to a semiconductor chip comprising a capacitor, the capacitor comprising: a plurality of conductive plates, each of the plates including a first conductive strip and a second conductive strip disposed over or under the first conductive strip, the second conductive strip of each plate being substantially parallel to the first conductive strip of the same plate, the second conductive strip of each plate electrically coupled to the first conductive strip of the plate through at least one conductive via, the second conductive strips of each group of at least two consecutive plates being spaced apart from each other in a direction along the length of the plates.

RELATED APPLICATION INFORMATION

This application is a continuation application of U.S. patentapplication Ser. No. 12/471,435, filed on May 25, 2009. U.S. patentapplication Ser. No. 12/471,435 is hereby incorporated by referenceherein.

FIELD OF THE INVENTION

Generally, the present invention relates to semiconductor devices, and,in particular, to semiconductor devices having capacitors.

BACKGROUND OF THE INVENTION

Capacitors may be a part of a semiconductor chip or integrated circuit.Examples of capacitors include vertical-parallel-plate (VPP) capacitors,metal-insulator-metal (MIM) capacitors, stacked capacitors and trenchcapacitors. New structures for capacitors are needed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a three dimensional view of a capacitor structure inaccordance with an embodiment of the present invention;

FIG. 2 shows a three-dimensional view of a conductive plate inaccordance with an embodiment of the present invention;

FIG. 3 shows a top view of the capacitor structure from FIG. 1;

FIG. 4A shows a cross sectional view of the capacitor structure fromFIG. 3;

FIG. 4B shows a cross sectional view of the capacitor structure fromFIG. 3;

FIG. 4C shows a cross sectional view of the capacitor structure fromFIG. 3;

FIG. 5 shows a three dimensional view of a capacitor structure inaccordance with an embodiment of the present invention;

FIG. 6 shows a three dimensional view of a conductive plate inaccordance with an embodiment of the present invention;

FIG. 7 shows a top view of the capacitor structure from FIG. 5;

FIG. 8A shows a cross sectional view of the capacitor structure fromFIG. 7;

FIG. 8B shows a cross sectional view of the capacitor structure fromFIG. 7;

FIG. 8C shows a cross sectional view of the capacitor structure fromFIG. 7;

FIG. 9A shows an embodiment of a capacitor structure in accordance withan embodiment of the present invention;

FIG. 9B shows an embodiment of a capacitor structure in accordance withan embodiment of the present invention; and

FIG. 9C shows an embodiment of a capacitor structure in accordance withan embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

The following detailed description refers to the accompanying drawingsthat show, by way of illustration, specific details and embodiments inwhich the invention may be practiced. These embodiments are described insufficient detail to enable those skilled in the art to practice theinvention. Other embodiments may be utilized and structural, logical,and electrical changes may be made without departing from the scope ofthe invention. The various embodiments are not necessarily mutuallyexclusive, as some embodiments can be combined with one or more otherembodiments to form new embodiments.

FIG. 1 shows a three dimensional view of a capacitor structure 100 whichis an embodiment of the present invention. FIG. 2 shows an example of aconductive plate 110 from the capacitor structure 100 of FIG. 1. FIG. 3shows a top view of the same capacitor structure 100 from FIG. 1. FIG.4A shows a cross sectional view of the same capacitor structure 100through the cross section AA from FIG. 3. FIG. 4B shows a crosssectional view of the capacitor structure 100 through the cross sectionBB from FIG. 3. FIG. 4C shows a cross sectional view of the capacitorstructure 100 through the cross section CC from FIG. 3.

Referring to FIG. 1, it is seen that the capacitor structure 100comprises a plurality of conductive plates 110. These are shown asconductive plates 110A through 110F. As noted, FIG. 2 shows an exampleof a conductive plate 110 from FIG. 1. The conductive plates 110 may bealternating coupled together to form first and second electrodes of thecapacitor structure 100. For example, the conductive plates 110A,C,E maybe electrically coupled together to form a first capacitor electrode ofthe capacitor 100 while conductive plates 110F,G,J may be electricallycoupled together to form a second electrode for the capacitor 100. Theconductive plates 110A,C,E may be referred to as first conductive plateswhich form a first capacitor electrode. Generally, the first capacitorelectrode may include one or more first conductive plates. Theconductive plates 110F,G,J may be referred to as second conductiveplates which form a second electrode of the capacitor 100. Generally,the second electrode may include one or more second conductive plates.

In one or more embodiments, the conductive plates 110 of the capacitorstructure 100 may be arranged so that they are substantially parallel toeach other. In one or more embodiments, the conductive plates 110 may bespacedly disposed from each other. In one or more embodiments, theconductive plates may be spacedly disposed from each other along a firstlateral direction. In one or more embodiments, the first lateraldirection may be the width direction corresponding to the width of theplates. In the embodiment shown in FIG. 1, the first lateral directionis the X-direction.

Referring to FIG. 2, each of the conductive plates 110 includes a firstconductive strip 122 and a second conductive strip 124 disposed over thefirst conductive strip 122. Each first conductive strip 122 may beelectrically coupled to a second conductive strip 124 by one or moreconductive vias 130. In one or more embodiments, the first conductivestrip 122 may be substantially parallel to the second conductive strip124.

In the embodiment of the conductive plate 110 shown in FIG. 2, a singlefirst conductive strip 122 is coupled to a corresponding single secondconductive strip by at least one conductive via 130. However, otherembodiments, it is possible that two or more second strips 124 may eachbe coupled to a single first strip 122, each by at least one conductivevia 130. For example, two or more second conductive strips 124 mayspacedly disposed along the length L1 of the conductive plate 110. Inone or more embodiments, the first conductive strip 122 of a conductiveplate 110 may be substantially parallel to the one or more secondconductive strips 124 of the same conductive plate 110. In one or moreembodiments, each of the conductive plates 110 may be substantiallyvertically disposed.

In the embodiment shown in FIGS. 1-3 (i.e. FIG. 1, FIG. 2, FIG. 3), theconductive vias 130 are shown as having a circular cross section,however, more generally, the conductive vias may have any crosssectional shape including, but not limited to, circular, elliptical,square and rectangular. In addition, in one or more embodiments, theconductive vias may taper. For example, they may be wider at the top andnarrower at the bottom.

Referring to FIGS. 1-4 (i.e., FIGS. 1, 2, 3, 4A, 4B, 4C), in one or moreembodiments, all of the first conductive strips 122 of the capacitorstructure 100 may be arranged so that they are substantially parallel toeach other. Each of the first conductive strips 122 may have a firstlateral dimension extending in a first lateral direction. In one or moreembodiments, the first lateral direction may be the width direction ofthe first conductive strips and the first lateral dimension of the firstconductive strips may be the width W1 of the first conductive strips. Inthe embodiment shown in FIGS. 1-4, the first lateral directioncorresponds to the X-direction. The width direction of the firstconductive strips 122 may also correspond to the width direction of theconductive plates 110. FIG. 2 shows a width W1 of a first conductivestrip 122.

Each of the first conductive strips 122 may have a second lateraldimension extending in a second lateral direction different from thefirst lateral direction. In one or more embodiments, the second lateraldirection may be substantially perpendicular to the first lateraldirection. In one or more embodiments, the second lateral direction maybe the length or longitudinal direction of the first conductive strips122. The second lateral dimension may correspond to the length of thefirst conductive strips 122. FIG. 2 shows a length L1 of a firstconductive strip 122. In one or more embodiments, the length L1 of thefirst conductive strips 122 may be greater than the width W1 of thefirst conductive strips 122. In the embodiment shown in FIGS. 1-4, thesecond lateral dimension (e.g. along the length of the first conductivestrips) corresponds to the Y-direction. In one or more embodiments, thelength direction of the first conductive strips 122 also corresponds tothe length direction of the conductive plates 110.

Hence, in the embodiment shown in FIGS. 1-4, the first lateral directionof the first conductive strips 122 (e.g. along the width) is theX-direction and the second lateral direction of the first conductivestrips 122 (e.g. along the length) is the Y-direction. As noted, in theembodiment shown in FIGS. 1-4, the first conductive strips 122 are shownhaving a width W1 in the X-direction and a length L1 in the Y-direction.In one or more embodiments, the length L1 may be greater than the widthW1. In one or more embodiments, the length direction of a conductiveplate 110 corresponds to the length direction of its corresponding firstconductive strip 122. Likewise, in one or more embodiments, the widthdirection of a conductive plate 110 corresponds to the width directionof its corresponding first conductive strip 122.

Referring to FIG. 2, the second conductive strips have width W2 in thefirst lateral direction or X-direction (e.g. width direction) and alength L2 in the second lateral direction or Y-direction (e.g. length orlongitudinal direction). In one or more embodiments, the width W2 of thesecond conductive strips may be less than the length L2 of the secondconductive strips. However, in another embodiment, the dimension of thesecond conductive strips 124 in the first lateral direction orX-direction (e.g. width direction) may be greater than the dimension inthe second lateral direction or Y-direction (e.g. length dimension).Likewise, in another embodiment, the dimension of the second conductivestrips 124 in the first lateral direction or X-direction may besubstantially the same as the dimension of the second conductive strips124 in the second lateral dimension or Y-direction. In one or moreembodiments, all of the second conductive strips 124 of the capacitorstructure 100 may be substantially parallel to each other.

Referring to FIG. 3 and FIGS. 4A-C (i.e., FIGS. 4A, 4B, 4C), each of thefirst conductive strips 122 may be separated from an adjacent firstconductive strip 122 by a distance S1 in the X-direction. The pitch ofthe first conductive strips 122 in the X-direction may correspond to adistance P1=W1+S1. In one or more embodiments, the pitch P1 of the firstconductive strips 122 in the X-direction may be a minimum pitch. In oneor more embodiments, the minimum pitch may be determined by minimumdistances achievable by photolithography.

In one or more embodiments, the second conductive strips 124 may bearranged such that the second conductive strips 124 of adjacentconductive plates 110 (e.g. two consecutive conductive plates 110) arespaced apart along the Y-direction (e.g. along the length of the firstconductive strips 122 or the length of the conductive plates 110). Forexample, referring to FIG. 3, it is seen the second conductive strip124B is spaced apart along the Y-direction from the second conductivestrip 124A by a distance G. Likewise, the second conductive 124B isspaced apart along the Y-direction from the conductive strip 124C by adistance G. Likewise, second conductive strip 124C is spaced apart fromsecond strip 124D along the Y-direction by a distance G. The same istrue for second strips 124D and 124E. The same is true for second strips124E and 124F.

In one or more embodiments, the second conductive strips 124 may bearranged such that the second conductive strips 124 of at least threeconsecutive conductive plates 110 (for example consecutive plates110A,B,C, or consecutive plates 110B,C,D, or consecutive plates110C,D,E, or consecutive plates 110D,E,F) are all spaced apart from eachother along the Y-direction (e.g. along the length of the firstconductive strips 122 or the length of the conductive plates 110).

As an example, referring to FIG. 3, plates 110A,B,C are threeconsecutive plates. The corresponding second strips 124 are secondstrips 124A,B,C. It is seen that second strips 124A,B,C are all spacedapart from each other in the Y-direction (e.g. in the length direction).Likewise, plates 110B,C,D are three consecutive plates. It is seen thatthe corresponding second conductive strips 124B,C,D are all spaced apartfrom each other in the Y-direction (e.g. in the length direction).Likewise, plates 110C,D,E are three consecutive plates. Thecorresponding second strips 124A,B,C are spaced apart in the Y-direction(e.g. in the length direction). Likewise, plates 110D,E,F areconsecutive plates. The corresponding second strips 124D,E,F are spacedapart in the Y-direction (e.g. in the length direction).

In one or more embodiments, the second conductive strips 124 may bearranged such that the second conductive strips 124 of at least Nconsecutive conductive plates 110 are all spaced apart from each otheralong the Y-direction (e.g. along the length of the first conductivestrips 122 or the length of the conductive plates 110). N may be 2, 3,4, 5, 6, 7, or 8. N may be greater than 8. N may be equal to M where Mis the number of conductive plates 110 in a capacitor arrangement.

Referring to FIG. 3 and to FIGS. 4A,B,C, in the embodiment shown, eachgroup of four consecutive plates include at least two second conductivestrips 124 that overlap in the Y-direction. This corresponds to thelongitudinal or length direction of the first conductive strips 122 (orto the longitudinal or length direction of the conductive plates 110).For example, the group of four consecutive plates 110A,B,C,D includessecond conductive strips 124A and 124D that overlap in the Y-direction.Likewise, the group of four consecutive plates 110B,C,D,E includessecond conductive strips 124B and 124E that overlap in the Y-direction.Likewise, the group of four consecutive plates 110C,D,E,F includessecond conductive strips 124C and 124F which overlap in the Y-direction(e.g. the direction along the length of the first conductive strips 122or along the length of the plates 110).

In other embodiments, each group of three consecutive plates 110 mayinclude at least two second conductive strips 124 that overlap in theY-direction (e.g. length direction). In one or more embodiments, eachgroup of N consecutive plate 110 may include at least two conductivestrips 124 that overlap in the Y-direction (e.g. length direction). Nmay, for example, be 2, 3, 4, 5, 6, 7, or 8. N may be more than 8. N maybe M where M is the number of conductive plates 110 in the capacitorstructure.

Referring to FIG. 3 and FIGS. 4A-C, the second conductive strips 124 mayhave a first lateral dimension or width W2 in the X-direction. Eachsecond conductive strip 124 may be separated by a distance S2 from thenext or adjacent second conductive strip that occurs along theX-direction (e.g. that overlaps in the Y-direction). For example, thesecond conductive strip 124A may be a distance S2 from the secondconductive strip 124D. It is seen that conductive strip 124A andconductive strip 124D overlap along the Y-direction. Hence, second strip124A is adjacent to second strip 124D in the X-direction (e.g. in adirection along the width of the first conductive strips 122 or alongthe width of the plates 110). Also, for example, the second conductivestrip 124B may be a distance S2 from the second conductive strip 124E.The second strip 124B overlaps with the second strip 124E along theY-direction. The second strip 124B is adjacent to the second strip 124Ein the X-direction (e.g. in the width direction). Also, for example, thesecond conductive strip 124C may be a distance S2 from the secondconductive strip 124F. Again, it is seen that the second strip 124Coverlaps with the second strip 124F along the Y-direction and the secondstrip 124C is adjacent to the second strip 124F in the X-direction (e.g.width direction). In the X-direction, in one or more embodiments, thepitch between adjacent second conductive strips 124 may be a pitchP2=W2+S2. In one or more embodiments, the pitch P2 between adjacentsecond conductive strips 124 in the X-direction may be a relaxed pitch(e.g. greater than minimum pitch).

In the embodiment shown, the second conductive strips 124 are arrangedover the first conductive strips 122. Hence, in one or more embodiments,the first conductive strips 122 may be formed as part of a lowermetallization level Mn while the second conductive strips may be formedas part of an upper metallization level Mn+1 which is above the lowermetallization level Mn. The lower and upper metallization levels may bepart of a semiconductor chip or an integrated circuit. The lowermetallization level Mn and the upper metallization level Mn+1 may beadjacent metallization levels.

In one or more embodiments, the widths of each of the first and/orsecond conductive strips may be substantially uniform along the lengthof the strip. In one or more embodiments, each of the second conductivestrips may have the shape of a parallelepiped. In one or moreembodiments, the parallelepiped may be a cuboid (six rectangular faces).In one or more embodiments, the cuboid may be a cube. Other shapes arealso possible.

In one or more embodiments, each of the conductive strips 122, 124 of aplate 110 may be substantially horizontally disposed. In an embodiment,the second strip 124 may be above the first strip 122 in an ascendingarrangement. In another embodiment, the second strip 124 may instead bebelow the first strip 122 in a descending arrangement.

In an embodiment, the ascending arrangement of conductive strips may besuch that the conductive plate has a vertical component. For example, inone or more embodiments, each of the conductive plates may besubstantially vertically disposed. In another embodiment, the first andsecond conductive strips of each conductive plate may have a step-likearrangement so that the conductive plate has a vertical component but istilted.

In one or more embodiments, each of the conductive plates 110 may be asubstantially vertical plate. In one or more embodiments, the plates 110may be substantially parallel to each other. In one or more embodiments,the capacitor structure 100 may be a vertical parallel plate capacitor.

In one or more embodiments, a capacitor of the present inventionincludes a first capacitor electrode and a second capacitor electrode.The first capacitor electrode may comprise one or more electricallycoupled first conductive plates. The second capacitor electrode maycomprise one or more electrically coupled second conductive plates. Theconductive plates may be arranged alternatingly such that a second platefollows a first plate and a first plate follows a second plate, etc. Thefirst and second conductive plates may be said to be opposite plates. Inone or more embodiments, the conductive plates may have any shape. Inone or more embodiments, each of the conductive plates of the firstcapacitor electrode and each of the conductive plates of the secondcapacitor electrode may be substantially vertically disposed. In one ormore embodiments, the capacitor may be a vertical parallel platecapacitor.

Referring to FIGS. 1-4, each of the conductive plates 110 of thecapacitor structure 100 may be separated from an adjacent plate by adielectric. Generally, any dielectric may be used. In one or moreembodiments, the dielectric may include an oxide, a nitride, anoxynitride and combinations thereof. The dielectric may comprise ahigh-k material. The high-k material may have a dielectric constantgreater than that of silicon dioxide. In one or more embodiments, thehigh-k material may have a dielectric constant greater than about 3.9.In one or more embodiments, the dielectric may be a gas. In one or moreembodiments, the dielectric may be air. In one or more embodiments, thedielectric may be a vacuum.

FIG. 5 shows a three-dimensional view of a capacitor structure 200 whichis another embodiment of the present invention. FIG. 6 shows an exampleof a conductive plate 210 from FIG. 5. FIG. 7 shows a top view of thesame capacitor structure 200 from FIG. 5. FIG. 8A shows a crosssectional view of the capacitor structure 200 through the cross sectionAA (shown in FIG. 7). FIG. 8B shows a cross sectional view of thecapacitor structure 200 through the cross section BB (shown in FIG. 7).FIG. 8C shows a cross sectional view of the capacitor structure 200through the cross section CC (shown in FIG. 7).

The discussion above related to the capacitor structure 100 and to theconductive plates 110 as shown in FIGS. 1-4 is applicable here for thecapacitor structure 200 and the conductive plates 210 shown in FIGS. 5-8(i.e., FIG. 5, FIG. 6, FIG. 7, FIG. 8A, FIG. 8B, FIG. 8C). Thedifference is that, in the embodiment shown in FIGS. 5-8, eachconductive plate 210 of capacitor structure 200 includes a firstconductive strip 122 and at least one second conductive strip 124 whichis disposed under the first conductive strip 122 (rather than disposedover a first conductive strip 122 as shown in FIGS. 1-4).

Referring to the embodiment shown in FIGS. 5-8, in one or moreembodiments, the second conductive strips 124 may be formed as part of alower metallization level Mn and the first conductive strips 122 may beformed as part of an upper metallization level Mn+1 which is above thelower metallization level Mn. Each second conductive strip 124 iscoupled to a corresponding first conductive strip through at least oneconductive via 130.

Referring to FIGS. 9A-C (i.e. FIG. 9A, FIG. 9B, FIG. 9C), anotherembodiment of the invention is a capacitor structure 300. The capacitorstructure 300 includes a plurality of first conductive strips 322. Thecapacitor structure 300 further includes a plurality of secondconductive strips 324 disposed over the first conductive strips. In oneor more embodiments the first conductive strips 322 may be substantiallyparallel to each other. In one or more embodiments, the secondconductive strips 324 may be substantially parallel to each other. Inone or more embodiments, the first conductive strips 322 may besubstantially perpendicular to the second conductive strips 324. In theembodiment shown, the first conductive strips 322 are oriented in theY-direction so that their lengths extend in the Y-direction (and theirwidths in the X-direction). In the embodiment shown, the secondconductive strips 324 are oriented in the X-direction so that theirlengths extend in the X-direction (and the widths in the Y-direction).In one or more embodiments, each of the second conductive strips 324 maycross over each of the first conductive strips 322.

In other embodiments, the first conductive strips 322 may extendlengthwise in a first direction and the second conductive strips 324 mayextend lengthwise in a second direction different from the firstdirection. In one or more embodiments, the first direction may besubstantially perpendicular to the Y-direction. In one or moreembodiments, the first and second conductive strips may form a gridstructure.

In the example shown in FIG. 9A, each of the first conductive strips 322is coupled to a second conductive strip 324 by at least one conductivevia 130. For example, referring to FIG. 9A, first strip 322X1 is coupledto second strip 324Y5 by a conductive via 130. Also, first strip 322X3is coupled to second strip 324Y3 by a conductive via 130, first strip322X5 is coupled to second strip 324Y1 by a conductive via, and firststrip 322X7 is coupled to second strip 324Y7 by a conductive via 130.

The first, second conductive strip pairs (322X1,324Y5), (322X3,324Y8),(322X5,324Y1), (322X7,324Y7) may all be electrically coupled together toform a first electrode of the capacitor structure 300.

Likewise, referring to FIG. 9A, first strip 322X2 is coupled to secondstrip 324Y8 by a conductive via 130. Also, first strip 322X4 is coupledto second strip 324Y6 by a conductive via 130, first strip 322X6 iscoupled to second strip 324Y4 by a conductive via 130, first strip 322X8is coupled to second strip 324Y2 by a conductive via 130.

The first, second conductive strip pairs (322X2,324Y8), (322X4,324Y6),(322X6,324Y4), (322X8,324Y2) may all be electrically coupled together toform a second electrode of the capacitor structure 300.

Referring to FIG. 9A, it is noted that the conductive vias 130 that aremarked (+) couple a first conductive strip to a second conductive stripand are part of the first capacitor electrode. Likewise, the conductivevias 130 that are marked (−) couple a first conductive strip to a secondconductive strip and are part of the second capacitor electrode.

Referring to FIG. 9B, it is seen that the first electrode of thecapacitor 300 is represented by the cross-hatched (e.g. darkened) gridstructure. Likewise, the second electrode of the capacitor 300 isrepresented by the non cross-hatched (e.g. non-darkened) grid structure.

In one or more embodiments, each of the first conductive strips 322 mayhave a width or dimension W1 in the X-direction. Also, the distancebetween adjacent first conductive strips 322 may be a distance S1 in theX-dimension. Hence, the pitch PX of the first conductive strips 322 inthe X-dimension may be a distance PX=W1+S1. In one or more embodiments,the pitch PX of the first conductive strips may be a minimum pitch.

In one or more embodiments, each of the second conductive strips 324 mayhave a width or dimension W2 in the Y-dimension. Also, the distancebetween each of the second conductive strips 324 may be a distance S2 inthe Y-dimension. Hence, the pitch PY in the Y-dimension between theconductive strips 324 may be a distance PY=W2+S2. In one or moreembodiments, the pitch PY of the second conductive strips 324 in theY-dimension may be a minimum pitch.

Referring to FIGS. 9A-C, in one or more embodiments, the conductive vias130 may be distributed such that there may be at least a distance Dbetween the centers of any two conductive vias 130.

In one or more embodiments, the distance D between the centers ofconductive vias may be such that:

D>SQRT((S1+W1)²+(S2+W2)²)

where SQRT is the square root function.

In at least one embodiment, the distance D may be such that:

D>1.5×SQRT((S1+W1)²+(S2+W2)²)

In at least one embodiment, the distance D may be such that:

D≧2×SQRT((S1+W1)²+(S2+W2)²)

Referring to the embodiment shown in FIG. 9C, it is seen that, for eachof the conductive vias 130 belonging to a particular capacitor electrode(e.g. to either the cross-hatched grid 315A or the non cross-hatchedgrid 315B), the neighboring corner cross points for the oppositecapacitor electrode do not include conductive vias. For example, theconductive via 130+ shown in FIG. 9C couples the first conductive strip322X3 to the second conductive strip 324Y3. The conductive via 130+ ispart of the first capacitor electrode 315A (e.g. the cross-hatchedgrid). For the conductive via 130+, there are four neighboring cornercross points that belong to the opposite conductive electrode 315B(e.g., the non cross-hatched grid). These corner cross points are markedC1 and do not include conductive vias. Likewise, the conductive via 130−shown in FIG. 9C couples the first conductive strip 322X6 to the secondconductive strip 324Y4. This conductive via 130− is part of the secondconductive electrode 315B (e.g. the non cross-hatched grid). For thisconductive via 130−, there are four neighboring corner cross points ofthe first capacitor electrode 315A (e.g. the cross-hatched grid). Thesecorner cross points are marked C2 and do not include conductive vias.

Generally, the first and second conductive strips as well as conductivevias disclosed herein may comprise any conductive material. In one ormore embodiments, the conductive material may comprise a metallicmaterial. The metallic material may comprise a pure metal. The metallicmaterial may comprise a metal alloy. The metallic material may comprise,without limitation, one or more elements from the group consisting ofAl, Cu, Au, Ag, W, Ti, and Ta.

As possible examples, the conductive strips and/or the conductive viasmay comprise one or more materials selected from the group consisting ofpure aluminum, aluminum alloy, pure copper, copper alloy, pure gold,gold alloy, pure silver, silver alloy, pure tungsten, tungsten alloy,pure titanium, titanium alloy, pure tantalum, and tantalum alloy.

It is possible that the conductive vias and conductive strips be formedof a non-metallic conductive material. For example, the conductivematerial may be a doped polysilicon material (such as n-type doped orp-type doped). The doping may, for example, be performed by implantationor it may be done in-situ. The conductive material may also be formed ofa conductive polymer.

The capacitor structures of the present invention may be integrated aspart of a semiconductor chip or integrated circuit.

The semiconductor chip or integrated circuit may include a substrate.The substrate may be a semiconductor substrate. The capacitor structuresdescribed herein may be formed over the substrate, on the substrateand/or within the substrate.

The substrate may be any type of semiconductor substrate. In anembodiment, the substrate may be a p-type substrate. However, moregenerally, in one or more embodiments of the invention, the substratemay be a silicon substrate or other suitable substrate. The substratemay be a bulk substrate such as a mono-crystallayer silicon substrate(or a grown thereon or otherwise formed therein), a of (110) silicon ona (100) silicon wafer, a silicon-on-insulator (SOI) substrate. The SOIsubstrate may, for example, be formed by a SIMOX process. The substratemay be a silicon-on-sapphire (SOS) substrate. The substrate may be agermanium-on-insulator (GeOI) substrate. The substrate may include oneor more materials such as semiconductor materials such as silicongermanium, germanium, germanium arsenide, indium arsenide, indiumarsenide, indium gallium arsenide, or indium antimonide.

The conductive plates described herein may comprise conductive strips.In one or more embodiments, each of the conductive strips may be formedof conductive lines belonging to various metallization levels of asemiconductor chip or integrated circuit. This includes, for example,metallization level 1, metallization level 2, etc. The metallizationlevels may be formed over a substrate (such as a semiconductorsubstrate).

In one or more embodiments, the conductive vias may, for example, beformed as conductive interconnects through the inter-level dielectriclayers between one metallization level and another metallization level.In one or more embodiments, the conductive vias may be formed asconductive interconnects through the dielectric between the substrateand the first metallization level (e.g. metallization level 1). In oneor more embodiments, the conductive vias may be formed as conductiveinterconnects through the substrate (such as a semiconductor substrate)of a semiconductor chip (such as, for example, through-substrate vias orthrough-silicon vias).

The capacitor structures described herein may comprise a first capacitorelectrode and a second capacitor electrode. The first and secondcapacitor electrodes may be separated by a dielectric. The firstelectrode may be electrically coupled to a first node on the samesemiconductor chip as the capacitor or to a first node on a differentchip from the capacitor. Likewise, the second capacitor electrode may beelectrically coupled to a second node on the same semiconductor chip asthe capacitor or to a node on a semiconductor chip which is differentfrom the capacitor.

In one or more embodiments, conductive lines (such as metallizationlines) which are above the capacitor, below the capacitor or on the samelevel as the capacitor may be used to electrically couple the first andsecond capacitor electrodes to nodes that are either on the samesemiconductor chip (or the same integrated circuit) or on a differentsemiconductor chip (or on a different semiconductor circuit). In one ormore embodiments, conductive vias may also be used for purposes ofelectrical coupling.

One or more embodiments relate to a semiconductor chip comprising acapacitor, the capacitor comprising: a plurality of conductive plates,each of the plates including a first conductive strip and a secondconductive strip disposed over or under the first conductive strip, thesecond conductive strip of each plate being substantially parallel tothe first conductive strip of the same plate, the second conductivestrip of each plate electrically coupled to the first conductive stripof the same plate through at least one conductive via, the secondconductive strips of each group of at least two consecutive plates beingspaced apart from each other in a direction along the length of theplates.

One or more embodiments related to a semiconductor chip comprising acapacitor, the capacitor comprising: a plurality of first conductivestrips disposed in a first metallization level; a plurality of secondconductive strips disposed in a second metallization level adjacent tothe first metallization level, each of the second strips beingelectrically coupled to a corresponding one of the first strips, each ofthe second strips being substantially parallel to the corresponding oneof the first strips, the second conductive strips corresponding to eachgroup of at least two consecutive first conductive strips being spacedapart from each other in a direction along the length of the firstconductive strips.

One or more embodiments related to a semiconductor chip comprising acapacitor, the capacitor comprising: a plurality of substantiallyparallel first conductive strips disposed in a first metallizationlevel, the first conductive strips having a minimum pitch in a directionalong the width of the first strips; and a plurality of secondconductive strips disposed in an adjacent second metallization level,each of the second strips being electrically coupled to a correspondingone of the first conductive strips by at least one conductive via, eachof the second strips being substantially parallel to the correspondingone of the first conductive strips, the conductive second strips havinga relaxed pitch in the direction along the width of the first strips.

One or more embodiments related to a semiconductor chip comprising acapacitor, the capacitor comprising: a plurality of substantiallyparallel first conductive strips oriented in a first direction, thefirst conductive strips comprising a first group of first strips and asecond group of first strips alternating with the first group of firststrips; a plurality of substantially parallel second conductive stripscrossing the first conductive strips, the second strips oriented in asecond direction different from the first direction, the second stripscomprising a first group of second strips and a second group of secondstrips alternating with the first group of second strips, the firstgroup of first strips crossing the first group of second strips to formfirst cross points, the second group of first strips crossing the secondgroup of second strips to form second cross points; a plurality of firstconductive vias coupled between the first group of first strips and thefirst group of second strips; and a plurality of second conductive viascoupled between the second group of first strips and the second group ofsecond strips, wherein the first cross points adjacent the second viasdo not include first vias, and wherein the second cross points adjacentthe first vias do not include second vias.

One or more embodiments relate to a semiconductor chip comprising acapacitor, the capacitor comprising: eight substantially parallel firstconductive strips oriented in a first direction, the first conductivestrips comprising a first group of first strips and a second group offirst strips alternating with the first group of first strips; eightsubstantially parallel second conductive strips crossing the firstconductive strips, the second strips oriented in a second directiondifferent from the first direction, the second strips comprising a firstgroup of second strips and a second group of second strips alternatingwith the first group of second strips, the first group of first stripscrossing the first group of second strips to form first cross points,the second group of first strips crossing the second group of secondstrips to form second cross points; at most four first conductive viascoupled between the first group of first strips and the first group ofsecond strips; and at most four second conductive vias coupled betweenthe second group of first strips and the second group of second strips.

The disclosure herein is presented in the form of detailed embodimentsdescribed for the purpose of making a full and complete disclosure ofthe present invention, and that such details are not to be interpretedas limiting the true scope of this invention as set forth and defined inthe appended claims.

1. A semiconductor chip comprising a capacitor, said capacitorcomprising: a plurality of substantially parallel first conductivestrips oriented in a first direction, said first conductive stripscomprising a first group of first strips and a second group of firststrips alternating with said first group of first strips; a plurality ofsubstantially parallel second conductive strips crossing said firstconductive strips, said second strips oriented in a second directiondifferent from said first direction, said second strips comprising afirst group of second strips and a second group of second stripsalternating with said first group of second strips, said first group offirst strips crossing said first group of second strips to form firstcross points, said second group of first strips crossing said secondgroup of second strips to form second cross points; a plurality of firstconductive vias coupled between said first group of first strips andsaid first group of second strips; and a plurality of second conductivevias coupled between said second group of first strips and said secondgroup of second strips, wherein the first cross points adjacent saidsecond vias do not include first vias, and wherein the second crosspoints adjacent said first vias do not include second vias.
 2. The chipof claim 1, wherein said first direction is substantially perpendicularto said second direction.
 3. The chip of claim 1, wherein said firststrips are formed at part of a first metallization level and said secondstrips are formed as part of a second metallization level different fromsaid first.
 4. The chip of claim 1, wherein said capacitor comprises afirst capacitor electrode spaced apart from a second capacitorelectrode, said first electrode including said first group of firststrips electrically coupled to said first group of second strips, saidsecond electrode including said second group of first stripselectrically coupled to said second group of second strips.
 5. Asemiconductor chip comprising a capacitor, said capacitor comprising:eight substantially parallel first conductive strips oriented in a firstdirection, said first conductive strips comprising a first group offirst strips and a second group of first strips alternating with saidfirst group of first strips; eight substantially parallel secondconductive strips crossing said first conductive strips, said secondstrips oriented in a second direction different from said firstdirection, said second strips comprising a first group of second stripsand a second group of second strips alternating with said first group ofsecond strips, said first group of first strips crossing said firstgroup of second strips to form first cross points, said second group offirst strips crossing said second group of second strips to form secondcross points; at most four first conductive vias coupled between saidfirst group of first strips and said first group of second strips; andat most four second conductive vias coupled between said second group offirst strips and said second group of second strips.
 6. The chip ofclaim 5, wherein said first direction is substantially perpendicular tosaid second direction.
 7. The chip of claim 5, wherein said first stripsare formed at part of a first metallization level and said second stripsare formed as part of a second metallization level different from saidfirst.
 8. The chip of claim 5, wherein said capacitor comprises a firstcapacitor electrode spaced apart from a second capacitor electrode, saidfirst electrode including said first group of first strips electricallycoupled to said first group of second strips, said second electrodeincluding said second group of first strips electrically coupled to saidsecond group of second strips.